U. D. Lanke

Quantitative study of molecular N_2 trapped in disordered GaN:O films

B. J. Ruck, A. Koo [1], U. D. Lanke, F. Budde [1], S. Granville [1], H. J. Trodahl, A. Bittar [2], J. B. Metson, V. J. Kennedy, A. Markwitz [3]

Abstract

The structure of disordered GaN:O films grown by ion-assisted deposition is investigated using x-ray absorption near-edge spectroscopy and Raman spectroscopy. It is found that between 4 and 21 % of the nitrogen in the films is in the form of molecular N_2 that interacts only weakly with the surrounding matrix. The anion to cation ratio in the GaN:O host remains close to unity, and there is a close correlation between the N_2 fraction, the level of oxygen impurities, and the absence of short-range order in the GaN:O matrix.