Kwangyeul Choi

In a linear radio-frequency (rf) ion trap, the rf null is the point of zero electric field in the dynamic trapping potential where the ion motion is approximately harmonic. When displaced from the rf null, the ion is superimposed by fast oscillations known as micromotion, which can be probed through motion-sensitive light-atom interactions. In this work, we report on the emergence of the rf pseudo-null, a locus of points where the ion responds to light as if it were at the true rf null, despite being displaced from it. The phenomenon is fully explained by accounting for the general two-dimensional structure of micromotion and is experimentally verified under various potential configurations, with observations in great agreement with numerical simulations. The rf pseudo-null manifests as a line in a two-dimensional parameter space, determined by the geometry of the incident light and its overlap with the motional structure of the ion. The true rf null occurs uniquely at the concurrent point of the pseudo-null lines induced by different light sources.

Silicon-based ion trap chips can benefit from existing advanced fabrication technologies, such as multi-metal layer techniques for two-dimensional architectures and silicon photonics for the integration of on-chip optical components. However, the scalability of these technologies may be compromised by semiconductor charging, where photogenerated charge carriers produce electric potentials that disrupt ion motion. Inspired by recent studies on charge distribution mechanisms in semiconductors, we developed a silicon-based chip with gold coated on all exposed silicon surfaces. This modification significantly stabilized ion motion compared to a chip without such metallic shielding, a result that underscores the detrimental effects of exposed silicon. With the mitigation of background silicon-induced fields to negligible levels, quantum operations such as sideband cooling and two-ion entangling gates, which were previously infeasible with the unshielded chip, can now be implemented.

Ion trap systems built upon microfabricated chips have emerged as a promising platform for quantum computing to achieve reproducible and scalable structures. However, photo-induced charging of materials in such chips can generate undesired stray electric fields that disrupt the quantum state of the ion, limiting high-fidelity quantum control essential for practical quantum computing. While crude understanding of the phenomena has been gained heuristically over the past years, explanations for the microscopic mechanism of photo-generated charge carrier dynamics remains largely elusive. Here, we present a photo-induced charging model for semiconductors, whose verification is enabled by a systematic interaction between trapped ions and photo-induced stray fields from exposed silicon surfaces in our chip. We use motion-sensitive qubit transitions to directly characterize the stray field and analyze its effect on the quantum dynamics of the trapped ion. In contrast to incoherent errors arising from the thermal motion of the ion, coherent errors are induced by the stray field, whose effect is significantly imprinted during the quantum control of the ion. These errors are investigated in depth and methods to mitigate them are discussed. Finally, we extend the implications of our study to other photo-induced charging mechanisms prevalent in ion traps.